The origins of pressure-induced phase transformations during the surface texturing of silicon using femtosecond laser irradiation

Journal of Applied Physics

Volumn 112, Issue 8, 2012, Pages

  Smith, Matthew J ^a   Sher, Meng Ju ^b   Franta, Benjamin ^b   Lin, Yu Ting ^b   Mazur, Eric ^b   Gradečak, Silvija ^a  

^a Massachusetts Institute of Technology   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE PERFORMANCE; FEMTOSECOND (FS) LASER; FS-LASER; GAUSSIAN PROFILES; IRRADIATION CONDITIONS; LASER-INDUCED DAMAGE; LIGHT-TRAPPING; MICRO RAMAN SPECTROSCOPY; PRESSURE-INDUCED PHASE TRANSFORMATIONS; RASTER SCANNING; SUB-SURFACES; SURFACE-TEXTURING;

LASER DAMAGE; PHASE TRANSITIONS; POLYMORPHISM; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAFAST LASERS;

SILICON;

EID: 84868348468     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4759140     Document Type: Article

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