Flexible subwavelength gratings fabricated by reversal soft UV nanoimprint

Chinese Optics Letters

Volumn 10, Issue 9, 2012, Pages

  Ge, Liangjin ^a   Wang, Xudi ^b   Chen, Huoyao ^a   Qiu, Keqiang ^a   Fu, Shaojun ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b HEFEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FINE PATTERN; HIGH ASPECT RATIO; LOW SURFACE ENERGY; LOW VISCOSITY; NANO-IMPRINT; NANOPATTERNING TECHNIQUES; PATTERN COLLAPSE; POLYURETHANE ACRYLATES; REPLICATION PROCESS; RIGOROUS COUPLED WAVE ANALYSIS; SACRIFICIAL LAYER; SPECIAL SURFACES; SUBWAVELENGTH GRATING; THEORETICAL CALCULATIONS; ULTRA-VIOLET; UV CURING PROCESS; UV IMPRINT; UV-NANOIMPRINT; WAVELENGTH REGIONS; WHOLE PROCESS;

CURING;

ASPECT RATIO;

EID: 84868262847     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201210.090502     Document Type: Article

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