SCOPUS 정보 검색 플랫폼

Optics Communications

Volumn 285, Issue 24, 2012, Pages 5475-5479

Advanced antireflective nanostructures etched down from nanosilver colloid-transformed island mask

(6) Park, Seong Je a Kim, Chul Hyun b Lee, Ji Hye b Jeong, Jun Ho b Lee, Eung Sug b Choi, Jun Hyuk b

a DS Hi Metal Inc (South Korea)

b Korea Institute of Machine and Materials (South Korea)

Author keywords

Antireflection; Colloidal lithography; Nanoparticles; Nanosilver islands; Nanostructure

Indexed keywords

ADVANCED FABRICATION; ANTI-REFLECTION; ANTIREFLECTIVE NANOSTRUCTURE; BROADBAND STABILITY; COLLOIDAL LITHOGRAPHY; COLLOIDAL MULTILAYERS; ETCH MASK; INCIDENCE ANGLES; MULTI-STEP; NANO SILVER; RANDOM ARRAY; REACTIVE ION ETCH; TUNABILITIES; VISIBLE REGION;

MASKS; NANOPARTICLES;

NANOSTRUCTURES;

EID: 84867582035 PISSN: 00304018 EISSN: None Source Type: Journal
DOI: 10.1016/j.optcom.2012.06.074 Document Type: Article

Times cited : (2)

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