Hierarchically ordered arrays of noncircular silicon nanowires featured by holographic lithography toward a high-fidelity sensing platform

Advanced Functional Materials

Volumn 22, Issue 20, 2012, Pages 4268-4274

  Jeon, Hwan Chul ^a   Heo, Chul Joon ^a   Lee, Su Yeon ^a   Yang, Seung Man ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

holographic lithography; localized surface plasmon resonance (LSPR); silicon nanowires; surface enhanced Raman scattering (SERS)

Indexed keywords

AU FILM; CONVENTIONAL PHOTOLITHOGRAPHY; ELECTRON BEAM EVAPORATION; ENHANCED FLUORESCENCE; ETCHING TIME; FLUORESCENT INTENSITY; GAP DISTANCES; HOLOGRAPHIC LITHOGRAPHY; HYBRID STRUCTURE; HYBRID SUBSTRATES; INTER-PARTICLE COUPLING; ION MILLING; LOCALIZED SURFACE PLASMON RESONANCE; METAL THIN FILM; NEAR INFRARED REGION; NON-CIRCULAR; ORDERED ARRAY; PLASMON RESONANCES; PLASMONIC; POLYMERIC MASKS; REACTION SOLUTIONS; SENSING PLATFORMS; SILICON NANOWIRES; STRUCTURAL EFFECT; SURFACE ENHANCED RAMAN SCATTERING (SERS); UNIFORM ARRAY;

COORDINATION REACTIONS; DEPOSITS; FLUORESCENCE; GOLD; INFRARED DEVICES; MILLING (MACHINING); NANOWIRES; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; POLYMERIC FILMS; PRISMS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SUBSTRATES; SURFACE PLASMON RESONANCE; THICK FILMS; WET ETCHING;

GOLD DEPOSITS;

EID: 84867570606     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201200921     Document Type: Article

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