Fabrication of three-dimensional photonic crystals using muitibeam interference lithography and electrodeposition

Advanced Materials

Volumn 21, Issue 29, 2009, Pages 3012-3015

  Miyake, Masao ^a   Chen, Ying Chieh ^a   Braun, Paul V ^a   Wiltzius, Pierre ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3D PHOTONIC CRYSTALS; A-SPOTS; FLATTER SURFACES; GLASS SUBSTRATES; HIGH QUALITY; INDIUM TIN OXIDE; INTERFERENCE LITHOGRAPHY; MULTIBEAM INTERFERENCE LITHOGRAPHY; NEGATIVE TONES; ORDERED STRUCTURES; POLYMER TEMPLATES; REFLECTION SPECTRA; STOP-BANDS; THREE DIMENSIONAL PHOTONIC CRYSTALS; TOP SURFACE;

CONDUCTING POLYMERS; CONDUCTIVE FILMS; CRYSTAL ATOMIC STRUCTURE; ELECTRODEPOSITION; FABRICATION; PHOTOLITHOGRAPHY; SILICON ON INSULATOR TECHNOLOGY; THREE DIMENSIONAL; TIN;

PHOTONIC CRYSTALS;

EID: 68149091570     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200802085     Document Type: Article

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