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Journal of Materials Chemistry

Volumn 22, Issue 11, 2012, Pages 4603-4606

Optically tunable arrayed structures for highly sensitive plasmonic detection via simplified holographic lithography

(5) Jeon, Hwan Chul a Heo, Chul Joon a Lee, Su Yeon a Park, Sung Gyu a Yang, Seung Man a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DOT ARRAY; ELECTRON BEAM EVAPORATION; FACE-CENTERED CUBIC STRUCTURE; HIGHLY SENSITIVE; HOLOGRAPHIC LITHOGRAPHY; LASER EXPOSURE; LIFT-OFF PROCESS; METAL DEPOSITION; PLASMONIC; SURFACE ENHANCED RAMAN SCATTERING;

OPTICAL PROPERTIES;

PLASMONS;

EID: 84863183163 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c2jm15723c Document Type: Article

Times cited : (21)

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