Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF 4/O 2

Plasma Sources Science and Technology

Volumn 21, Issue 5, 2012, Pages

  Song, Sang Heon ^a   Kushner, Mark J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; DUAL FREQUENCY; DUTY CYCLES; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; ELECTRON ENERGY DISTRIBUTIONS; ELECTRON LOSS; ELECTRON-ELECTRON COLLISIONS; EQUILIBRIUM CONDITIONS; HYDRODYNAMICS MODELS; MONTE CARLO SIMULATION; PLASMA CHARACTERISTICS; PULSE PERIOD; PULSE REPETITION FREQUENCIES; PULSED-POWER; QUASI-STEADY STATE; RATE COEFFICIENTS; REAL-TIME BALANCE; TWO-DIMENSIONAL PLASMA;

DISSOCIATION; ELECTRON SOURCES; MICROELECTRONICS; MONTE CARLO METHODS;

PULSE REPETITION RATE;

EID: 84867279513     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/5/055028     Document Type: Article

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