Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges

Journal of Physics D: Applied Physics

Volumn 43, Issue 12, 2010, Pages

  Amara, V ^a   Bowden, M D ^a   Braithwaite, N St J ^a  

^a OPEN UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AFTERGLOW DECAY; CAPACITIVELY COUPLED; CAPACITIVELY COUPLED DISCHARGES; CAPACITIVELY COUPLED RF DISCHARGE; ELECTRON DENSITIES; GAS PRESSURES; GASEOUS ELECTRONICS; LOW PRESSURES; OPTICAL EMISSIONS; PLASMA PROPERTIES; POWER MODULATION; PULSE CYCLE; PULSE DURATIONS; PULSED DISCHARGE; RADIO FREQUENCY DISCHARGES; RADIO-FREQUENCY POWER; RADIO-FREQUENCY PULSE; RF-POWER;

ARGON;

MODULATION;

EID: 77949501321     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/12/124017     Document Type: Article

References (19)

1. Pearton S J and Norton D R 2005 Plasma Process. Polym. 2 16-37
2. Wu B Q 2006 J. Vac. Sci. Technol. B 24 1-15
3. Haas F A, Goodyear A and Braithwaite N S 1998 Plasma Sources Sci. Technol. 7 471-7
4. Samukawa S 2006 High-performance and Damage-Free Neutral-Beam Etching Processes Using Negative Ions in Pulse-Time-Modulated Plasma (Mt Fuji, Japan) pp 6681-9
5. Mieno T and Samukawa S 1996 Generation and Extinction Characteristics of Negative Ions in Pulse-Time-Modulated Electron Cyclotron Resonance Chlorine Plasma (Poprad, Slovakia) pp 398-404
6. Goto H H, Lowe H D and Ohmi T 1991 Dual Excitation Reactive Ion Etcher for Low-Energy Plasma Processing (Seattle, WA) pp 3048-54
7. Boyle P C, Ellingboe A R and Turner M M 2004 J. Phys. D: Appl. Phys. 37 697-701
8. Ramamurthi B and Economou D J 2002 Plasma Sources Sci. Technol. 11 324-32
9. Overzet L J and Kleber J 1998 Plasma Sources Sci. Technol. 7 512-23
10. Wang S B and Wendt A E 2000 J. Appl. Phys. 88 643-6
11. Patterson M M, Chu H Y and Wendt A E 2007 Plasma Sources Sci. Technol. 16 257-64
12. Ahn T H, Nakamura K and Sugai H 1996 Plasma Sources Sci. Technol. 5 139-44
13. Hopkins M B 1995 J. Res. Natl Inst. Stand. Technol. 100 415-25
14. Braithwaite N S J and Franklin R N 2009 Plasma Sources Sci. Technol. 18
15. Piejak R B, Godyak V A, Garner R, Alexandrovich B M and Sternberg N 2004 J. Appl. Phys. 95 3785-91
16. Piejak R B, Al-Kuzee J and Braithwaite N S 2005 Plasma Sources Sci. Technol. 14 734-43
17. Hargis P J et al 1994 Rev. Sci. Instrum. 65 140-54
18. Ashida S, Shim M R and Lieberman M A 1996 J. Vac. Sci. Technol. A-Vac. Surf. Films 14 391-7
19. Bogaerts A 2007 J. Anal. At. Spectrom. 22 502-12