Rapid preparation of electron beam induced deposition Co magnetic force microscopy tips with 10 nm spatial resolution

Review of Scientific Instruments

Volumn 83, Issue 9, 2012, Pages

  Belova, L M ^a   Hellwig, Olav ^b   Dobisz, Elizabeth ^b   Dan Dahlberg, E ^c  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b HITACHI AMERICA LTD   (United States)

^c University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPE CANTILEVERS; ELECTRON BEAM-INDUCED DEPOSITION; FOCUSED ELECTRON BEAMS; GAS PRECURSORS; HIGH RESOLUTION; MAGNETIC FORCE MICROSCOPES; MAGNETIC FORCE MICROSCOPY TIPS; SIGNAL TO NOISE; SPATIAL RESOLUTION;

CARBON DIOXIDE; MAGNETIC FORCE MICROSCOPY;

ELECTRON BEAMS;

EID: 84866980746     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4752225     Document Type: Review

References (20)

1. P. B. Fischer, M. S. Wei, and S. Y. Chou, J. Vac. Sci. Technol. B 11, 2570 (1993). 10.1116/1.586626
2. M. Ruhrig, S. Porthun, and J. C. Lodder, Rev. Sci. Instrum. 65, 3224 (1994). 10.1063/1.1144554
3. G. D. Skidmore and E. Dan Dahlberg, Appl. Phys. Lett. 71, 3293 (1997). 10.1063/1.120316
4. M. R. Koblischka, U. Hartmann, and T. Sulzbach, J. Magn. Magn. Mater. 272-276, 2138 (2004). 10.1016/j.jmmm.2004.01.030
5. L. Folks, M. E. Best, P. M. Rice, B. D. Terris, and D. Weller, Appl. Phys. Lett. 76, 909 (2000). 10.1063/1.125626
6. G. N. Philips, M. Siekman, L. Abelmann, and J. C. Lodder, Appl. Phys. Lett. 81, 865 (2002). 10.1063/1.1497434
7. Z. Deng, E. Yenilmez, J. Leu, J. E. Hoffman, E. W. J. Straver, H. Dai, and K. A. Moler, Appl. Phys. Lett. 85, 6263 (2004). 10.1063/1.1842374
8. H. Kuramochi, T. Uzumaki, M. Yasutake, A. Tanaka, A. Akinaga, and H. Yokoyama, Nanotechnology 16, 24 (2005). 10.1088/0957-4484/16/1/006
9. I. Utke, P. Hoffmann, R. Berger, and L. Scandella, Appl. Phys. Lett. 80, 4792 (2002). 10.1063/1.1489097
10. L. Belova, E. Dan Dahlberg, A. Riazanova, J. J. L. Mulders, C. Christopherson, and J. Eckert, Nanotechnology 22, 145305 (2011). 10.1088/0957-4484/22/14/145305
11. W. F. van Dorp and C. W. Hagen, J. Appl. Phys. 104, 081301 (2008). 10.1063/1.2977587
12. I. Utke, P. Hoffman, and J. Melngailis, J. Vac. Sci. Technol. B 26, 1197 (2008). 10.1116/1.2955728
13. Calculated by Hans Mulders of FEI using the model of I. Utke, V. Friedli, S. Amorosi, J. Michler, and P. Hoffmann, Microelectron. Eng. 83, 1499 (2006). 10.1016/j.mee.2006.01.136
14. M. Gabureac, L. Bernau, I. Utke, and G. Boero, Nanotechnology 21, 115503 (2010). 10.1088/0957-4484/21/11/115503
15. D. Rugar, H. J. Mamin, P. Grutter, S. E. Lambert, J. E. Stern, I. McFadyen, and T. Yogi, J. Appl. Phys. 68, 1169 (1990). 10.1063/1.346713
16. Th. Kebe and A. Carl, J. Appl. Phys. 95, 775 (2004). 10.1063/1.1633979
17. O. Hellwig, T. Hauet, T. Thompson, E. Dobisz, J. D. Risner-Jamtgaard, D. Yaney, B. D. Terris, and E. E. Fullerton, Appl. Phys. Lett. 95, 232505 (2009). 10.1063/1.3271679
18. T. Hauet, E. Dobisz, S. Florez, J. Park, B. Lengsfield, B. D. Terris, and O. Hellwig, Appl. Phys. Lett. 95, 262504 (2009). 10.1063/1.3276911
19. S. Porthun, L. Abelman, S. J. L. Vellekoop, J. C. Lodder, and H. Hug, Appl. Phys. A 66, S1185-S1189 (1998). 10.1007/s003390051323
20. L. Gao, L. P. Yue, T. Yokota, R. Skomski, S.-H. Liou, H. Takahoshi, H. Saito, and S. Ishio, IEEE Trans. Mag. 40 2194 (2004). 10.1109/TMAG.2004.829173