Environmental photostability of SF 6-etched silicon nanocrystals

Nanotechnology

Volumn 23, Issue 39, 2012, Pages

  Liptak, R W ^a   Yang, J ^a   Kramer, N J ^a   Kortshagen, U ^a   Campbell, S A ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY OF DEFECTS; ENVIRONMENTAL STABILITY; PARAMAGNETIC SPINS; PHOTO-STABILITY; PL QUANTUM YIELD; PLASMA REACTORS; ROOM TEMPERATURE OXIDATION; SILICON NANOCRYSTALS; SURFACE OXIDATIONS; UV IRRADIATION; UV STABILITY;

DEFECT DENSITY; PARAMAGNETISM; PHOTOBLEACHING; PLASMA APPLICATIONS; QUANTUM YIELD;

SULFUR HEXAFLUORIDE;

EID: 84866438774     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/39/395205     Document Type: Article

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