In-flight dry etching of plasma-synthesized silicon nanocrystals

Applied Physics Letters

Volumn 91, Issue 8, 2007, Pages

  Pi, X D ^a   Liptak, R W ^a   Campbell, S A ^a   Kortshagen, U ^a  

^a University of Minnesota

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SHIFT; DRY ETCHING; OXIDATION; PHOTOLUMINESCENCE; PLASMAS; SILICON;

ATMOSPHERIC OXIDATION; BLUESHIFTS; ROOM-TEMPERATURE; SIZE REDUCTION;

NANOCRYSTALS;

EID: 34548203507     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2773931     Document Type: Article

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