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Volumn 47, Issue 10, 2012, Pages 2891-2894
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Properties of Cu-doped ZnO films by RF sputtering method: Thickness dependence
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Author keywords
A. Thin films; B. Sputtering; C. X ray diffraction; D. Optical properties
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Indexed keywords
C-AXIS ORIENTATIONS;
CHEMICAL STATE;
COPPER AND ZINC;
CRYSTALLINITIES;
CU-DOPED ZNO;
GLASS SUBSTRATES;
RADIO-FREQUENCY SPUTTERING;
RF SPUTTERING METHOD;
THICKNESS DEPENDENCE;
VALENCE STATE;
VISIBLE REGION;
WURTZITE STRUCTURE;
X-RAY DIFFRACTION SPECTROSCOPY;
XPS DATA;
XRD;
ZNO;
FILM THICKNESS;
OPTICAL PROPERTIES;
PHOTOELECTRONS;
SUBSTRATES;
SURFACE DEFECTS;
SURFACE ROUGHNESS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC;
ZINC OXIDE;
ZINC SULFIDE;
COPPER;
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EID: 84866307800
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/j.materresbull.2012.04.103 Document Type: Conference Paper |
Times cited : (19)
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References (26)
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