|
Volumn 519, Issue 13, 2011, Pages 4366-4370
|
Structural properties of low-temperature grown ZnO thin films determined by X-ray diffraction and X-ray absorption spectroscopy
|
Author keywords
Epitaxy; Extented X ray absorption fine structure spectroscopy; Hall effect measurement; Thin films; X ray absorption near edge structure spectroscopy; X ray diffraction; Zinc oxide
|
Indexed keywords
ANGLE-DEPENDENT;
C-AXIS ORIENTATIONS;
CRYSTALLINITIES;
CRYSTALLOGRAPHIC ORIENTATIONS;
DC REACTIVE SPUTTERING;
EPITAXY;
EXAFS;
EXTENDED X-RAY ABSORPTION FINE STRUCTURES;
EXTENTED X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;
HALL-EFFECT MEASUREMENT;
LOCAL STRUCTURE;
LOW SUBSTRATE TEMPERATURE;
LOW-TEMPERATURE GROWN;
SPECTRAL FEATURE;
WURTZITE STRUCTURE;
X-RAY ABSORPTION NEAR-EDGE STRUCTURE;
XANES SPECTRA;
XRD;
ZNO FILMS;
ZNO THIN FILM;
ABSORPTION;
CARRIER CONCENTRATION;
DIFFRACTION;
EPITAXIAL FILMS;
EPITAXIAL GROWTH;
GALVANOMAGNETIC EFFECTS;
HALL MOBILITY;
METALLIC FILMS;
OPTICAL FILMS;
OXIDE FILMS;
SUBSTRATES;
X RAY ABSORPTION;
X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAYS;
ZINC;
ZINC OXIDE;
ZINC SULFIDE;
ABSORPTION SPECTROSCOPY;
|
EID: 79954444199
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.02.009 Document Type: Article |
Times cited : (7)
|
References (20)
|