Effect of thermal annealing on the mechanical properties of low-emissivity physical vapor deposited multilayer-coatings for architectural applications

Thin Solid Films

Volumn 520, Issue 24, 2012, Pages 7130-7135

  Meszaros, Robert ^a   Merle, Benoit ^a   Wild, Michael ^b   Durst, Karsten ^a   Göken, Mathias ^a   Wondraczek, Lothar ^a,c  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b Interpane Glasgesellschaft MbH ^*  (Germany)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Annealing; Atomic force microscopy; Glass; Low emissivity coatings; Nanomechanics

Indexed keywords

AFTER-HEAT TREATMENT; CURVATURE ANALYSIS; DIELECTRIC LAYER; DIMENSIONAL CHANGES; HIGH TEMPERATURE STABILITY; LOW-EMISSIVITY COATING; MODERN BUILDINGS; PHYSICAL VAPOR DEPOSITED; PRIMARY FACTORS; PRODUCTION PROCESS; RESIDUAL COMPRESSIVE STRESS; RESIDUAL STRESS STATE; RESIDUAL TENSILE STRESS; SHORT-TERM EXPOSURE; STONEY'S EQUATION; THERMAL-ANNEALING; YOUNG'S MODULUS;

ANNEALING; ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; ELECTROMAGNETIC WAVE EMISSION; ENERGY MANAGEMENT; GLASS; NANOMECHANICS; VAPORS;

COATINGS;

EID: 84866023414     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.07.086     Document Type: Article

References (52)

1. M. Arbab, and J.J. Finley Int. J. Appl. Glass Sci. 1 1 2010 118
2. H.J. Gläser Appl. Opt. 47 13 2008 C193
3. J.J. Finley Thin Solid Films 351 1-2 1999 264
4. C.B. Greenberg Ind. Eng. Chem. Res. 40 1 2000 26
5. G. Beister, E. Dietrich, C. Schaefer, M. Scherer, and J. Szczyrbowski Surf. Coat. Technol. 76-77 1995 776 (/Part 2)
6. G. Leftheriotis, S. Papaefthimiou, and P. Yianoulis Sol. State Ion. 136-137 2000 655
7. L. Wondraczek, J.C. Mauro, J. Eckert, U. Kühn, J. Horbach, J. Deubener, and T. Rouxel Adv. Mater. 23 39 2011 4578
8. S.K. Sharma, and J. Spitz Thin Solid Films 65 3 1980 339
9. M. Asoro, D. Kovar, J. Damiano, and P. Ferreira Microsc. Microanal. 16 Suppl. S2 2010 1802
10. E. Ando, and M. Miyazaki Thin Solid Films 516 14 2008 4574
11. E. Ando, and M. Miyazaki Thin Solid Films 392 2 2001 289
12. R.C. Ross Sol. Energ. Mater. 21 1 1990 25
13. G.C. Han, Y.H. Wu, P. Luo, J.J. Qiu, and T.C. Chong Solid State Commun. 126 8 2003 479
14. E. Cetinörgü, and S. Goldsmith J. Phys. D Appl. Phys. 40 17 2007 5220
15. O. Akhavan, and A.Z. Moshfegh Appl. Surf. Sci. 254 2 2007 548
16. O. Akhavan, A. Azarm, A.Z. Moshfegh, and M.A. Bahrevar Appl. Surf. Sci. 252 15 2006 5335
17. A.Z. Moshfegh, and O. Akhavan Thin Solid Films 370 1-2 2000 10
18. M.A. Nicolet Thin Solid Films 52 3 1978 415
19. S. Bhagat, H. Han, and T.L. Alford Thin Solid Films 515 4 2006 1998
20. E. G-Berasategui, S.J. Bull, and T.F. Page Thin Solid Films 447-448 2004 26
21. H.K. Pulker Thin Solid Films 89 2 1982 191
22. R.W. Hoffman Thin Solid Films 89 2 1982 155
23. K. Kinosita Thin Solid Films 12 1 1972 17
24. D.A. Hardwick Thin Solid Films 154 1-2 1987 109
25. D. Nir Thin Solid Films 112 1 1984 41
26. I. Ozen, and M.A. Gülgün Adv. Sci. Technol. 45 2006 1316
27. R. Meszaros, M. Wild, B. Merle, and L. Wondraczek Glass Technol: Eur. J. Glass Sci. Technol. A 52 6 2011 190
28. R.W. Hoffman Mater. Sci. Eng. 53 1 1982 37
29. S.P. Kim, H.M. Choi, and S.K. Choi Thin Solid Films 322 1-2 1998 298
30. E. Barthel, O. Kerjan, P. Nael, and N. Nadaud Thin Solid Films 473 2 2005 272
31. E. Barthel, A. Perriot, D. Dalmas, E. Sondergard, and P. Nael Surf. Coat. Technol. 200 22-23 2006 6181
32. G. Stachoviak, US Patent 6830817 B2 (2004).
33. G. Kleideiter, A. Zmelty, M. Geisler, US Patent 7651774 B2 (2010).
34. H. Schicht, L. Ihlo, U. Schmidt, M. Kühne, DE Pat. 102005038139 B4 (2008).
35. A.E.T. Kuiper, M.F.C. Willemsen, J.M.L. Mulder, J.B.O. Elferink, F.H.P.M. Habraken, and W.F.V.D. Weg J. Vac. Sci. Technol. B Microelectr. Nano. Struct. 7/3 1989 455
36. J.W. Beams C.A. Neugebauer, C.A. Newkirk, D.A. Vermilyea, Structure and Properties of Thin Films 1995 Willey New York 183
37. O. Tabata, K. Kawahata, S. Sugiyama, and I. Igarashi Sens. Actuators 20 1-2 1989 135
38. M. Small, and W.D. Nix J. Mater. Res. 7 6 1992 1553
39. J.J. Vlassak, and W.D. Nix J. Mater. Res. 7 12 1992 3242
40. A.J. Kalkman, A.H. Verbruggen, G.C.A.M. Janssen, and F.H. Groen Rev. Sci. Instrum. 70 10 1999 4026
41. Y. Xiang, and J.J. Vlassak Scr. Mater. 53 2 2005 177
42. B. Merle, and M. Göken Acta Mater. 59 4 2011 1772
43. G.G. Stoney Proc. R. Soc. Lond. A 82 553 1909 172
44. G.C.A.M. Janssen, M.M. Abdalla, F. van Keulen, B.R. Pujada, and B. van Venrooy Thin Solid Films 517 6 2009 1858
45. A. Mezin Surf. Coat. Technol. 200 18-19 2006 5259
46. W.C. Oliver, and G.M. Pharr J. Mater. Res. 7 6 1992 1564
47. http://gwyddion.net/.
48. J.Z. Xie, S.P. Murarka, X.S. Guo, and W.A. Lanford J. Vac. Sci. Technol. B: Microelectr. Nano. Struct. 7 2 1989 150
49. N. Martin, C. Rousselot, D. Rondot, F. Palmino, and R. Mercier Thin Solid Films 300 1-2 1997 113
50. Y.-Q. Hou, D.-M. Zhuang, G. Zhang, M. Zhao, and M.-S. Wu Appl. Surf. Sci. 218 1-4 2003 98
51. J.-H. Huang, and M.-S. Wong Thin Solid Films 520 5 2011 1379
52. M.M. Smedskjaer, M. Jensen, and Y. Yue J. Non-Cryst. Sol. 356 18-19 2010 893