A study on the crystallographic orientation with residual stress and electrical property of Al films deposited by sputtering

Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 298-302

  Kim, S P ^a   Choi, H M ^a   Choi, S K ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Al metallization; Orientation; Residual stress; Resistivity

Indexed keywords

ALUMINUM; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY OF SOLIDS; MAGNETRON SPUTTERING; METALLIZING; RESIDUAL STRESSES; SPUTTER DEPOSITION; THIN FILMS;

ALUMINUM THIN FILMS;

METALLIC FILMS;

EID: 0032496505     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00926-7     Document Type: Article

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