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Volumn 148, Issue 9-10, 2008, Pages 395-398

Effects of annealing temperature of buffer layer on structural and optical properties of ZnO thin film grown by atomic layer deposition

Author keywords

A. ZnO; B. Annealing; B. Atomic layer deposition

Indexed keywords

ANNEALING; ATOMIC PHYSICS; ATOMS; BUFFER LAYERS; CRYSTAL ATOMIC STRUCTURE; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILMS; ZINC ALLOYS; ZINC OXIDE;

EID: 54249111777     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2008.09.034     Document Type: Article
Times cited : (39)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.