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Volumn 358, Issue 17, 2012, Pages 2099-2102

Deposition and characterization of polymorphous germanium films prepared by low frequency PECVD

Author keywords

Amorphous; Germanium; PECVD; Plasma; Polymorphous

Indexed keywords

CROSS SECTION; DEPOSITION PRESSURES; ELECTRIC CHARACTERISTICS; GERMANIUM FILMS; KEY PARAMETERS; LOW FREQUENCY; OPTIMAL PRESSURE; POLYMORPHOUS; PRESSURE VALUES; TEMPERATURE COEFFICIENT OF RESISTANCE; TEMPERATURE DEPENDENCE; THERMAL DETECTION;

EID: 84865748995     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2012.01.061     Document Type: Conference Paper
Times cited : (7)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.