|
Volumn 358, Issue 17, 2012, Pages 2099-2102
|
Deposition and characterization of polymorphous germanium films prepared by low frequency PECVD
|
Author keywords
Amorphous; Germanium; PECVD; Plasma; Polymorphous
|
Indexed keywords
CROSS SECTION;
DEPOSITION PRESSURES;
ELECTRIC CHARACTERISTICS;
GERMANIUM FILMS;
KEY PARAMETERS;
LOW FREQUENCY;
OPTIMAL PRESSURE;
POLYMORPHOUS;
PRESSURE VALUES;
TEMPERATURE COEFFICIENT OF RESISTANCE;
TEMPERATURE DEPENDENCE;
THERMAL DETECTION;
ACTIVATION ENERGY;
AMORPHOUS MATERIALS;
ATOMIC FORCE MICROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMAS;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
GERMANIUM;
|
EID: 84865748995
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2012.01.061 Document Type: Conference Paper |
Times cited : (7)
|
References (15)
|