Thermo-sensing silicon-germanium-boron films prepared by plasma for un-cooled micro-bolometers

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2556-2560

  Torres, A ^a   Moreno, M ^a   Kosarev, A ^a   Heredia, A ^b  

^a INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

^b UNIVERSIDAD POPULAR AUTÓNOMA DEL ESTADO DE PUEBLA   (Mexico)

Author keywords

Amorphous semiconductors; Conductivity; Germanium; Plasma deposition; Silicon

Indexed keywords

AMORPHOUS SEMICONDUCTORS; BOLOMETERS; ELECTRIC CONDUCTIVITY; PHASE COMPOSITION; PLASMA DEPOSITION; THIN FILMS;

MICROBOLOMETERS; SOLID PHASE COMPOSITION; THERMOSENSING FILMS;

SILICON ALLOYS;

EID: 43049133730     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.112     Document Type: Article

References (5)

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