Amorphous-nanocrystalline Al doped ZnO transparent conducting thin films

Journal of Alloys and Compounds

Volumn 536, Issue SUPPL.1, 2012, Pages

  Diez Betriu X ^a   Jimenez Rioboo R ^a   Marcos, J Sánchez ^a   Cespedes E ^a   Espinosa, A ^a   De Andres A ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

Al:ZnO; RF sputtering; Spectroscopic ellipsometry (SE); Transparent conducting oxides; X ray reflectivity (XRR)

Indexed keywords

AL-DOPED ZNO; AMORPHOUS FRACTION; ANNEALING TEMPERATURES; ANNEALING TREATMENTS; FILMS THICKNESS; GLASS SUBSTRATES; OPTICAL AND ELECTRICAL CHARACTERIZATION; OPTICAL GAP; RF-POWER; RF-SPUTTERING; ROOM TEMPERATURE; STRUCTURAL STUDIES; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT CONDUCTING OXIDE FILMS; X RAY REFLECTIVITY;

ALUMINUM; AMORPHOUS FILMS; ANNEALING; CONDUCTIVE FILMS; OXIDE FILMS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; ZINC OXIDE;

OPTICAL FILMS;

EID: 84865696727     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.01.057     Document Type: Conference Paper

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