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Applied Physics Letters

Volumn 79, Issue 14, 2001, Pages 2199-2201

Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films

(6) Martin I a Vetter, M b Orpella, A b Puigdollers, J b Cuevas, A c Alcubilla, R b

a UNIVERSITAT ROVIRA I VIRGILI (Spain)

b UNIVERSITAT POLITÈCNICA DE CATALUNYA (Spain)

c AUSTRALIAN NATIONAL UNIVERSITY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035475390 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1404406 Document Type: Article

Times cited : (129)

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