Silicon nanowires obtained by low temperature plasma-based chemical vapor deposition

Materials Research Society Symposium Proceedings

Volumn 1408, Issue , 2012, Pages 139-144

  Puglisi, R A ^a   Mannino, G ^a   Scalese, S ^a   La Magna, A ^a   Privitera, V ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR; EQUIVALENT THICKNESS; GOLD NANODOTS; INDUCTIVELY-COUPLED; LOW TEMPERATURES; METAL CATALYST; PLASMA POWER; SELECTIVE GROWTH; SI SUBSTRATES; SILICON NANOWIRES; VAPOR-LIQUID-SOLID GROWTH;

CHEMICAL VAPOR DEPOSITION; ELECTROMAGNETIC INDUCTION; GOLD; NANOTUBES; NANOWIRES; VAPORS;

SILICON;

EID: 84865036913     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2012.718     Document Type: Conference Paper

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