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Volumn 93, Issue 10 1, 2003, Pages 6117-6124

Contact resistance in organic transistors that use source and drain electrodes formed by soft contact lamination

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; ELECTRODES; LAMINATING; SEMICONDUCTING FILMS;

EID: 0038650905     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1568157     Document Type: Article
Times cited : (302)

References (21)
  • 1
    • 25344467452 scopus 로고    scopus 로고
    • and references contained therein
    • See, for example, MRS Bull. 27, (2002) and references contained therein.
    • (2002) MRS Bull. , vol.27
  • 16
    • 0037290286 scopus 로고    scopus 로고
    • H. Klauk, G. Schmid, W. Radlik, W. Weber, L. Zhou, C. D. Sheraw, J. A. Nichols, and T. N. Jackson, 47, 297 (2003)
    • P. V. Necliudov, M. S. Shur, D. J. Gundlach, and T. N. Jackson, Solid-State Electron. 47, 259 (2003); H. Klauk, G. Schmid, W. Radlik, W. Weber, L. Zhou, C. D. Sheraw, J. A. Nichols, and T. N. Jackson, 47, 297 (2003).
    • (2003) Solid-State Electron. , vol.47 , pp. 259
    • Necliudov, P.V.1    Shur, M.S.2    Gundlach, D.J.3    Jackson, T.N.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.