Generation of metal patterns by topography-directed deposition

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1509-1511

  Qi, Dianpeng ^a   Lu, Nan ^a   Yang, Bingjie ^a   Xu, Hongbo ^a   Xu, Miaojun ^a   Chi, Lifeng ^a,b  

^a Jilin University   (China)

^b UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Deposition; Generation; Metal patterns; Topography directed

Indexed keywords

ELECTROCHEMICAL DEPOSITION; FEATURE SIZES; GENERATION; HIGH RESOLUTION; METAL PATTERNS; MICROSCALE PATTERNS; SILVER ARRAYS;

OPTOELECTRONIC DEVICES; REDUCTION; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SILVER;

METALS;

EID: 76949101056     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.063     Document Type: Article

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