Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism

Beilstein Journal of Nanotechnology

Volumn 3, Issue 1, 2012, Pages 507-512

  Hlawacek, Gregor ^a   Veligura, Vasilisa ^a   Lorbek, Stefan ^b   Mocking, Tijs F ^a   George, Antony ^a   van Gastel, Raoul ^a   Zandvliet, Harold J W ^a   Poelsema, Bene ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Channeling; Contrast mechanism; Helium ion microscopy; Ion scattering; Thin layers

Indexed keywords

CHANNELING; CONTRAST MECHANISM; HELIUM ION; ION SCATTERING; THIN LAYERS;

BACKSCATTERING; CHEMICAL ELEMENTS; HELIUM; ION MICROSCOPES; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; SELF ASSEMBLED MONOLAYERS; VISUALIZATION;

IONS;

EID: 84864302442     PISSN: None     EISSN: 21904286     Source Type: Journal    
DOI: 10.3762/bjnano.3.58     Document Type: Article

References (14)

1. Ward, B. W.; Notte, J. A.; Economou, N. P. J. Vac. Sci. Technol., B 2006, 24, 2871-2874. doi:10.1116/1.2357967
2. Hill, R.; Faridur Rahman, F. H. M. Nucl. Instrum. Methods Phys. Res., Sect. A 2011, 645, 96-101. doi:10.1016/j.nima.2010.12.123
3. Veligura, V.; Hlawacek, G.; van Gastel, R.; Poelsema, B.; Zandvliet, H. J. W. Beilstein J. Nanotechnol. 2012, 3, 501-506. doi:10.3762/bjnano.3.57
4. Petrov, Y. V.; Vyvenko, O. F.; Bondarenko, A. S. J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 2010, 4, 792-795. doi:10.1134/S1027451010050186
5. van Gastel, R.; Barriss, L.; Sanford, C.; Hlawacek, G.; Scipioni, L.; Merkle, A.; Voci, D.; Fenner, C.; Zandvliet, H.; Poelsema, B. Microsc. Microanal. 2011, 17 (Suppl. S2), 928-929. doi:10.1017/S1431927611005514
6. Ramachandra, R.; Griffin, B.; Joy, D. Ultramicroscopy 2009, 109, 748-757. doi:10.1016/j.ultramic.2009.01.013
7. George, A.; Knez, M.; Hlawacek, G.; Hagedoorn, D.; Verputten, H. H. J.; van Gastel, R.; ten Elshof, J. E. Langmuir 2012, 28, 3045-3052. doi:10.1021/la204437r
8. Hlawacek, G.; Puschnig, P.; Frank, P.; Winkler, A.; Ambrosch-Draxl, C.; Teichert, C. Science 2008, 321, 108-111. doi:10.1126/science.1159455
9. Lorbek, S.; Hlawacek, G.; Teichert, C. Eur. Phys. J.: Appl. Phys. 2011, 55, 23902. doi:10.1051/epjap/2011100428
10. Mocking, T. F.; Hlawacek, G.; Zandvliet, H. J. W. Surf. Sci. 2012, 606, 924-927. doi:10.1016/j.susc.2012.02.007
11. Ziegler, J. F.; Biersack, J. P.; Ziegler, M. D. SRIM, the stopping and range of ions in matter; Lulu Press: Morrisville, NC; USA, 2008.
12. Kinchin, G. H.; Pease, R. S. Rep. Prog. Phys. 1955, 18, 1-51. doi:10.1088/0034-4885/18/1/301
13. Singh, J.; Whitten, J. E. J. Phys. Chem. C 2008, 112, 19088-19096. doi:10.1021/jp807536z
14. Wu, K.-Y.; Yu, S.-Y.; Tao, Y.-T. Langmuir, 2009, 25, 6232-6238. doi:10.1021/la900046b