Characterization of step-edge barriers in organic thin-film growth

Science

Volumn 321, Issue 5885, 2008, Pages 108-111

  Hlawacek, Gregor ^a   Puschnig, Peter ^a   Frank, Paul ^b   Winkler, Adolf ^b   Ambrosch Drax, Claudia ^a   Teichert, Christian ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH; MICROSCOPY; MORPHOLOGY;

ARTICLE; ATOMIC FORCE MICROSCOPY; DRY DEPOSITION; ELECTRIC POTENTIAL; ENERGY RESOURCE; FILM; INFRARED RADIATION; LIGHT EMITTING DIODE; MATHEMATICAL ANALYSIS; MORPHOLOGY; NUCLEAR PHYSICS; PRIORITY JOURNAL; SEMICONDUCTOR;

EID: 46849117297     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1159455     Document Type: Article

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