Scanning helium ion microscope: Distribution of secondary electrons and ion channeling

Journal of Surface Investigation

Volumn 4, Issue 5, 2010, Pages 792-795

  Petrov, Yu V ^a   Vyvenko, O F ^a   Bondarenko, A S ^a  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR DEPENDENCE; AU FILM; BACK-SCATTERED; ENERGY DISTRIBUTIONS; ION CHANNELING; ION YIELDS; MEASUREMENT DATA; SECONDARY ELECTRONS; SILICON SINGLE CRYSTALS;

ANGULAR DISTRIBUTION; CRYSTAL ORIENTATION; GOLD; HELIUM; ION BEAMS; SECONDARY EMISSION; SILICON WAFERS; SINGLE CRYSTALS;

IONS;

EID: 77958003793     PISSN: 10274510     EISSN: 18197094     Source Type: Journal    
DOI: 10.1134/S1027451010050186     Document Type: Article

References (14)

1. E. B. Myuller, Usp. Fiz. Nauk 77, 481 (1962).
2. V. N. Tondare, J. Vac. Sci. Technol. A 23, 1498 (2005).
3. J. Notte, R. Hill, S. McVey, et al., Microsc. Microanal. 12, 126 (2006).
4. B. W. Ward and J. A. Notte, J. Vac. Technol. B 24, 2871 (2006).
5. J. Morgan, J. Notte, R. Hill, and B. Ward, Microsc. Today 14(4), 24 (2006).
6. S. Kalbitzer and V. Zhukov, Open Appl. Phys. J. 1, 4 (2008).
7. R. Ramachandra, B. Griffin, and D. Joy, Ultramicroscopy 109, 748 (2009).
8. K. Inai, K. Ohya, and T. Ishitani, J. Electron Microsc. 56(5), 163 (2007).
9. V. Sidorkin, E. van Veldhoven, E. van der Drift, et al., J. Vac. Sci. Technol. B 27(4), L18 (2009).
10. D. S. Gemmell, Rev. Mod. Phys. 46, 129 (1974).
11. D. C. Joy, M. S. Prasad, and H. M. Meyer, J. Microsc. 215, 77 (2004).
12. K. Ohya, T. Yamanaka, K. Inai, and T. Ishitani, Nucl. Instrum. Methods Phys. Res. B 267, 584 (2008).
13. K. Ohya and J. Kawata, Nucl. Instrum. Methods Phys. Res. B 115, 265 (1996).
14. I. Lindkhard, Usp. Fiz. Nauk 99, 249 (1969).