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EPJ Applied Physics

Volumn 55, Issue 2, 2011, Pages

Determination of critical island size in para -sexiphenyl islands on SiO2 using capture-zone scaling

(3) Lorbek, S a Hlawacek, G a,b Teichert, C a

a UNIVERSITY OF LEOBEN (Austria)

b UNIVERSITY OF TWENTE (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL NUCLEUS SIZE; ISLAND SHAPE; ISLAND SIZE; ORGANIC THIN FILMS; PARA-SEXIPHENYL; ROOM TEMPERATURE; SUBMONOLAYER FILMS;

AMORPHOUS FILMS; AMORPHOUS SILICON; FLEXIBLE ELECTRONICS; SILICA; SILICON COMPOUNDS; SILICON OXIDES;

FILM GROWTH;

EID: 80051978799 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap/2011100428 Document Type: Article

Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.