Transparent conductivity of fluorine-doped anatase TiO 2 epitaxial thin films

Journal of Applied Physics

Volumn 111, Issue 9, 2012, Pages

  Mohri, Satoru ^a,b   Hirose, Yasushi ^a,b,c   Nakao, Shoichiro ^b,c   Yamada, Naoomi ^b   Shimada, Toshihiro ^a,b,c   Hasegawa, Tetsuya ^a,b,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE TIO; ELECTRONIC-POLARIZABILITY; EPITAXIAL THIN FILMS; F-DOPING; FLUORINE SOURCE; FLUORINE-DOPED; IONICITIES; LOW RESISTIVITY; OPTIMAL GROWTH; REACTIVE PULSED LASER DEPOSITION; TIO; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVITY;

EPITAXIAL GROWTH; FILM GROWTH; FLUORINE; PULSED LASER DEPOSITION; REFRACTIVE INDEX; THIN FILMS;

TITANIUM DIOXIDE;

EID: 84864257383     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4712061     Document Type: Article

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