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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 851-855

Electrical and optical properties of Nb-doped TiO2 films deposited by dc magnetron sputtering using slightly reduced Nb-doped TiO 2-x ceramic targets

(6) Sato, Yasushi a Sanno, Yuta a Tasaki, Chihiro a Oka, Nobuto a Kamiyama, Toshihisa b Shigesato, Yuzo a

a AOYAMA GAKUIN UNIVERSITY (Japan)

b AGC Ceramics Co Ltd (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE TIO; CARRIER DENSITY; CERAMIC TARGET; DC MAGNETRON SPUTTERING; DOPED-TIO; ELECTRICAL AND OPTICAL PROPERTIES; HIGH TRANSPARENCY; OXYGEN FLOW RATIOS; POLYCRYSTALLINE; POST ANNEALING; VISIBLE REGION;

ELECTRIC PROPERTIES; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; OXYGEN; TITANIUM DIOXIDE;

OPTICAL PROPERTIES;

EID: 77954206295 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3358153 Document Type: Conference Paper

Times cited : (33)

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