Actinic microscope for extreme ultraviolet lithography photomask inspection and review

Optics Express

Volumn 20, Issue 14, 2012, Pages 15752-15768

  Goldstein, Michael ^a,b   Naulleau, Patrick ^c  

^a SEMATECH   (United States)

^b INTEL CORPORATION   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

AERIAL IMAGES; CO-OPTIMIZE; EXTREME ULTRAVIOLET; MASK PATTERNS; PERFORMANCE REQUIREMENTS; PHOTOMASK METROLOGY; REFERENCE DESIGNS;

PHOTOMASKS;

EID: 84863759106     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.015752     Document Type: Article

References (20)

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