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Volumn 352, Issue 1, 2012, Pages 203-208

Overgrowth of GaN on GaN nanowires produced by mask-less etching

Author keywords

A1. Defects; A1. Etching; A1. GaN nanowires; A1. X ray diffraction; A3. Lateral overgrowth; B1. Nitrides

Indexed keywords

DEFECT REDUCTION; DISLOCATION DENSITIES; ETCHING RATE; GAN FILM; GAN NANOWIRES; HIGH DISLOCATION DENSITY; LATERAL OVERGROWTH; RESIDUAL STRAINS; SAPPHIRE SUBSTRATES;

EID: 84863300651     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.12.055     Document Type: Conference Paper
Times cited : (4)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.