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Journal of Applied Physics

Volumn 111, Issue 3, 2012, Pages

Kinetics aspects of initial stage thin γ-Al 2O 3 film formation on single crystalline β-NiAl (110)

(4) Zhang, Zhongfan a Jung, Keeyoung a Li, Long a Yang, Judith C a

a University of Pittsburgh (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM FORMATIONS; HIGH FIELD; INITIAL STAGES; KINETICS AND MECHANISM; KINETICS MODELS; MEASURED DATA; OXIDATION KINETICS; OXIDE THICKNESS; PARABOLIC BEHAVIOR; RATE LAWS; SINGLE-CRYSTALLINE; THICKNESS REGIME;

CRYSTALLINE MATERIALS; RATE CONSTANTS; REACTION INTERMEDIATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

KINETICS;

EID: 84863133282 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3682111 Document Type: Article

Times cited : (8)

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