γ-Al2O3 thin film formation via oxidation of β-NiAl(1 1 0)

Acta Materialia

Volumn 59, Issue 15, 2011, Pages 5905-5916

  Zhang, Zhongfan ^a   Li, Long ^a   Yang, Judith C ^a  

^a University of Pittsburgh   (United States)

Author keywords

Al2O3; Cross sectional transmission electron microscopy; NiAl alloy; Oxidation

Indexed keywords

ALUMINUM OXIDES; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; EPITAXIAL RELATIONSHIPS; HIGHER TEMPERATURES; KURDJUMOV-SACHS; NIAL ALLOY; NISHIYAMA-WASSERMANN; OXIDATION TEMPERATURE; OXIDE GROWTH; PHASE PRECIPITATE; POLYCRYSTALLINE; SHORT-TIME OXIDATION; STRUCTURE AND MORPHOLOGY; TEMPERATURE RANGE; THIN FILM FORMATION;

EPITAXIAL GROWTH; FILM GROWTH; LATTICE MISMATCH; OXIDATION; OXIDE FILMS; SINGLE CRYSTALS; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINUM;

EID: 79960993618     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2011.05.064     Document Type: Article

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