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Vacuum

Volumn 86, Issue 12, 2012, Pages 1850-1854

Characterization of β-Ga 2O 3 thin films on sapphire (0001) using metal-organic chemical vapor deposition technique

(6) Lv, Yu a Ma, Jin a Mi, Wei a Luan, Caina a Zhu, Zhen a Xiao, Hongdi a

a SHANDONG UNIVERSITY (China)

Author keywords

Crystal structure; Gallium oxide; MOCVD; Thin film; X ray diffraction

Indexed keywords

DIFFERENT SUBSTRATES; EPITAXIAL RELATIONSHIPS; GALLIUM OXIDES; STRUCTURAL AND OPTICAL PROPERTIES; TRIMETHYL GALLIUM; VISIBLE-WAVELENGTH RANGE;

ALUMINUM; CRYSTAL STRUCTURE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; OXYGEN; SAPPHIRE; SUBSTRATES; THIN FILMS; VAPORS; X RAY DIFFRACTION;

GALLIUM ALLOYS;

EID: 84862995063 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2012.04.019 Document Type: Article

Times cited : (112)

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