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Volumn 6, Issue , 2011, Pages 1-5

III-nitride grating grown on freestanding HfO 2 gratings

Author keywords

Fast atom beam etching; InGaN GaN QWs; Molecular beam epitaxy

Indexed keywords

FAST ATOM BEAMS; FILM EVAPORATION; GRATING STRUCTURES; GROWTH CONDITIONS; GUIDED-MODE RESONANCE; III-NITRIDE; INGAN/GAN; INGAN/GAN QUANTUM WELL; PHOTOLUMINESCENCE SPECTRUM; SILICON PROCESS; STRESS CHANGES;

EID: 84862947787     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276x-6-497     Document Type: Article
Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.