Electroassisted fabrication of free-standing silica structures of micrometer size

Chemistry of Materials

Volumn 24, Issue 12, 2012, Pages 2265-2273

  Luna Vera, Fernando ^a   Dong, Dong ^a,b   Hamze, Rasha ^a,c   Liu, Shantang ^a,d   Collinson, Maryanne M ^a  

^a VIRGINIA COMMONWEALTH UNIVERSITY   (United States)

^b Red Avenue Chemical Co Ltd ^*  (China)

^c AMERICAN UNIVERSITY OF BEIRUT   (Lebanon)

^d WUHAN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

electrodeposition; microstructures; porous materials; sol gel chemistry

Indexed keywords

1-OCTADECANETHIOL; APPLIED POTENTIALS; COLLOIDAL PARTICLE; DIFFERENT GEOMETRY; ELECTROLYSIS TIME; ETCHING PROCESS; HYDROPHILIC AND HYDROPHOBIC; INDIUM TIN OXIDE ELECTRODES; INTERCONNECTED PORES; MICROMETER SIZES; NEGATIVE POTENTIAL; OPEN FRAMEWORKS; PATTERNED ARRAYS; POROUS SILICA; RECESSED ELECTRODES; SCANNING ELECTRON MICROSCOPY IMAGE; SELECTIVE REMOVAL; SILICA STRUCTURES; SOL-GEL CHEMISTRY; TETRAMETHOXYSILANE; THICK LAYERS;

ADHESION; AGGLOMERATION; ELECTRODEPOSITION; ELECTRODES; GOLD; HYDROPHILICITY; HYDROPHOBICITY; INDIUM COMPOUNDS; MICROSTRUCTURE; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SOL-GELS; SUBSTRATES; TIN; TIN OXIDES;

SILICA;

EID: 84862899848     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm203714n     Document Type: Article

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