SCOPUS 정보 검색 플랫폼

Journal of Alloys and Compounds

Volumn 520, Issue , 2012, Pages 250-254

Effect of incorporating copper on resistive switching properties of ZnO films

(3) Jia, C H a Dong, Q C a Zhang, W F a

a HENAN UNIVERSITY (China)

Author keywords

Resistive switching; ZnO:Cu

Indexed keywords

C-AXIS ORIENTATIONS; IMPEDANCE SPECTRUM; LOW-RESISTANCE STATE; ON/OFF RATIO; RESISTANCE STATE; RESISTANCE SWITCHING EFFECT; RESISTIVE SWITCHING; SCHOTTKY BARRIERS; WURTZITE STRUCTURE; ZNO; ZNO FILMS;

HETEROJUNCTIONS; METALLIC FILMS; PULSED LASER DEPOSITION; SCHOTTKY BARRIER DIODES; SWITCHING SYSTEMS; ZINC OXIDE; ZINC SULFIDE;

COPPER;

EID: 84862779336 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2012.01.035 Document Type: Article

Times cited : (33)

References (26)

1
- 41149099157
- G.I. Meijer Science 319 2008 1625
- (2008) Science , vol.319 , pp. 1625
- Meijer, G.I.¹

2
- 43049126833
- D.B. Strukov, G.S. Snider, D.R. Stewart, and R.S. Williams Nature 453 2008 80
- (2008) Nature , vol.453 , pp. 80
- Strukov, D.B.¹ Snider, G.S.² Stewart, D.R.³ Williams, R.S.⁴

3
- 76749132114
- Y.C. Yang, F. Pan, and F. Zeng New J. Phys. 12 2010 023008
- (2010) New J. Phys. , vol.12 , pp. 023008
- Yang, Y.C.¹ Pan, F.² Zeng, F.³

4
- 25144462707
- U. Ozgur, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Dogan, V. Avrutin, S.J. Cho, and H. Morkoc J. Appl. Phys. 98 2005 041301
- (2005) J. Appl. Phys. , vol.98 , pp. 041301
- Ozgur, U.¹ Alivov, Y.I.² Liu, C.³ Teke, A.⁴ Reshchikov, M.A.⁵ Dogan, S.⁶ Avrutin, V.⁷ Cho, S.J.⁸ Morkoc, H.⁹

5
- 57649200464
- C.H. Jia, Y.H. Chen, G.H. Liu, X.L. Liu, S.Y. Yang, and Z.G. Wang J. Cryst. Growth 311 2008 200
- (2008) J. Cryst. Growth , vol.311 , pp. 200
- Jia, C.H.¹ Chen, Y.H.² Liu, G.H.³ Liu, X.L.⁴ Yang, S.Y.⁵ Wang, Z.G.⁶

6
- 78149306444
- T.S. Herng, D.C. Qi, T. Berlijn, J.B. Yi, K.S. Yang, Y. Dai, Y.P. Feng, I. Santoso, C. Sanchez-Hanke, X.Y. Gao, A.T.S. Wee, W. Ku, J. Ding, and A. Rusydi Phys. Rev. Lett. 105 2010 207201
- (2010) Phys. Rev. Lett. , vol.105 , pp. 207201
- Herng, T.S.¹ Qi, D.C.² Berlijn, T.³ Yi, J.B.⁴ Yang, K.S.⁵ Dai, Y.⁶ Feng, Y.P.⁷ Santoso, I.⁸ Sanchez-Hanke, C.⁹ Gao, X.Y.¹⁰ Wee, A.T.S.¹¹ Ku, W.¹² Ding, J.¹³ Rusydi, A.¹⁴

7
- 51849147852
- J.B. Kim, D. Byun, S.Y. Ie, D.H. Park, W.K. Choi, J.W. Choi, and B. Angadi Semicond. Sci. Technol. 23 2008 095004
- (2008) Semicond. Sci. Technol. , vol.23 , pp. 095004
- Kim, J.B.¹ Byun, D.² Ie, S.Y.³ Park, D.H.⁴ Choi, W.K.⁵ Choi, J.W.⁶ Angadi, B.⁷

8
- 27844532514
- X.B. Wang, D.M. Li, F. Zeng, and F. Pan J. Phys. D: Appl. Phys. 38 2005 4104
- (2005) J. Phys. D: Appl. Phys. , vol.38 , pp. 4104
- Wang, X.B.¹ Li, D.M.² Zeng, F.³ Pan, F.⁴

9
- 70349142287
- T. Ghosh, and D. Basak J. Phys. D: Appl. Phys. 42 2009 145304
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 145304
- Ghosh, T.¹ Basak, D.²

10
- 61349125533
- T. Ghosh, M. Dutta, S. Mridha, and D. Basak J. Electrochem. Soc. 156 2009 H285
- (2009) J. Electrochem. Soc. , vol.156 , pp. 285
- Ghosh, T.¹ Dutta, M.² Mridha, S.³ Basak, D.⁴

11
- 59349109262
- A. Furukawa, N. Ogasawara, R. Yokozawa, and T. Tokunaga Jpn. J. Appl. Phys. 47 2008 8799
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 8799
- Furukawa, A.¹ Ogasawara, N.² Yokozawa, R.³ Tokunaga, T.⁴

12
- 0030244693
- A. Hartmann, M.K. Puchert, and R.N. Lamb Surf. Interface Anal. 24 1996 671
- (1996) Surf. Interface Anal. , vol.24 , pp. 671
- Hartmann, A.¹ Puchert, M.K.² Lamb, R.N.³

13
- 77958052612
- H.L. Pan, B. Yao, T. Yang, Y. Xu, B.Y. Zhang, W.W. Liu, and D.Z. Shen Appl. Phys. Lett. 97 2010 142101
- (2010) Appl. Phys. Lett. , vol.97 , pp. 142101
- Pan, H.L.¹ Yao, B.² Yang, T.³ Xu, Y.⁴ Zhang, B.Y.⁵ Liu, W.W.⁶ Shen, D.Z.⁷

14
- 77957858900
- H.W.P. Carvalho, A.P.L. Batista, P. Hammer, and T.C. Ramalho J. Hazard. Mater. 184 2010 273
- (2010) J. Hazard. Mater. , vol.184 , pp. 273
- Carvalho, H.W.P.¹ Batista, A.P.L.² Hammer, P.³ Ramalho, T.C.⁴

15
- 34548482052
- C.H. Jia, Y.H. Chen, L.H. Ding, and W.F. Zhang Appl. Surf. Sci. 253 2007 9506
- (2007) Appl. Surf. Sci. , vol.253 , pp. 9506
- Jia, C.H.¹ Chen, Y.H.² Ding, L.H.³ Zhang, W.F.⁴

16
- 67650102619
- R. Waser, R. Dittmann, G. Staikov, and K. Szot Adv. Mater. 21 2009 2632
- (2009) Adv. Mater. , vol.21 , pp. 2632
- Waser, R.¹ Dittmann, R.² Staikov, G.³ Szot, K.⁴

17
- 77953004840
- H.Y. Peng, G.P. Li, J.Y. Ye, Z.P. Wei, Z. Zhang, D.D. Wang, G.Z. Xing, and T. Wu Appl. Phys. Lett. 96 2010 192113
- (2010) Appl. Phys. Lett. , vol.96 , pp. 192113
- Peng, H.Y.¹ Li, G.P.² Ye, J.Y.³ Wei, Z.P.⁴ Zhang, Z.⁵ Wang, D.D.⁶ Xing, G.Z.⁷ Wu, T.⁸

18
- 36849101960
- J.R. Yeargan, and H.L. Taylor J. Appl. Phys. 39 1968 5600
- (1968) J. Appl. Phys. , vol.39 , pp. 5600
- Yeargan, J.R.¹ Taylor, H.L.²

19
- 53649104523
- H. Yang, H. Wang, G.F. Zou, M. Jain, N.A. Suvorova, D.M. Feldmann, P.C. Dowden, R.F. Depaula, J.L. MacManus-Driscol, A.J. Taylor, and Q.X. Jia Appl. Phys. Lett. 93 2008 142904
- (2008) Appl. Phys. Lett. , vol.93 , pp. 142904
- Yang, H.¹ Wang, H.² Zou, G.F.³ Jain, M.⁴ Suvorova, N.A.⁵ Feldmann, D.M.⁶ Dowden, P.C.⁷ Depaula, R.F.⁸ MacManus-Driscol, J.L.⁹ Taylor, A.J.¹⁰ Jia, Q.X.¹¹

20
- 84857634773
- M.A.M. Khan, M.W. Khan, M. Alhoshan, M.S. Alsalhi, and A.S. Aldwayyan Appl. Phys. A. 100 2010 45
- (2010) Appl. Phys. A. , vol.100 , pp. 45
- Khan, M.A.M.¹ Khan, M.W.² Alhoshan, M.³ Alsalhi, M.S.⁴ Aldwayyan, A.S.⁵

21
- 0034889495
- Y.M. Tsau, Y.C. Chen, H.F. Cheng, and I.N. Lin J. Eur. Ceram Soc. 21 2001 1561
- (2001) J. Eur. Ceram Soc. , vol.21 , pp. 1561
- Tsau, Y.M.¹ Chen, Y.C.² Cheng, H.F.³ Lin, I.N.⁴

22
- 43549126477
- A. Sawa Mater. Today 11 2008 28
- (2008) Mater. Today , vol.11 , pp. 28
- Sawa, A.¹

23
- 33751557951
- Y.H. You, B.S. So, J.H. Hwang, W. Cho, S.S. Lee, T.M. Chung, C.G. Kim, and K.S. An Appl. Phys. Lett. 89 2006 222105
- (2006) Appl. Phys. Lett. , vol.89 , pp. 222105
- You, Y.H.¹ So, B.S.² Hwang, J.H.³ Cho, W.⁴ Lee, S.S.⁵ Chung, T.M.⁶ Kim, C.G.⁷ An, K.S.⁸

24
- 77950558976
- D.A. Scrymgeour, C. Highstrete, Y.J. Lee, J.W.P. Hsu, and M. Lee J. Appl. Phys. 107 2010 064312
- (2010) J. Appl. Phys. , vol.107 , pp. 064312
- Scrymgeour, D.A.¹ Highstrete, C.² Lee, Y.J.³ Hsu, J.W.P.⁴ Lee, M.⁵

25
- 77949267092
- J. Lee, E.M. Bourim, D. Shin, J.S. Lee, D.J. Seong, J. Park, W. Lee, M. Chang, S. Jung, J. Shin, and H. Hwang Curr. Appl. Phys. 10 2010 e68
- (2010) Curr. Appl. Phys. , vol.10 , pp. 68
- Lee, J.¹ Bourim, E.M.² Shin, D.³ Lee, J.S.⁴ Seong, D.J.⁵ Park, J.⁶ Lee, W.⁷ Chang, M.⁸ Jung, S.⁹ Shin, J.¹⁰ Hwang, H.¹¹

26
- 3242892591
- S. Tsui, A. Baidalov, J. Cmaidalka, Y.Y. Sun, Y.Q. Wang, Y.Y. Xue, C.W. Chu, L. Chen, and A.J. Jacobson Appl. Phys. Lett. 85 2004 317
- (2004) Appl. Phys. Lett. , vol.85 , pp. 317
- Tsui, S.¹ Baidalov, A.² Cmaidalka, J.³ Sun, Y.Y.⁴ Wang, Y.Q.⁵ Xue, Y.Y.⁶ Chu, C.W.⁷ Chen, L.⁸ Jacobson, A.J.⁹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.