Formation of CoNi alloy thin films on silicon by electroless deposition

Electrochimica Acta

Volumn 75, Issue , 2012, Pages 42-48

  Kim, Dong Uk ^a   Shanmugam, Rajakumar ^a   Choi, Myung Ryul ^a   Yoo, Bongyoung ^a  

^a Hanyang University   (South Korea)

Author keywords

CoNi alloy; Electroless deposition; Hydrazine; NH 4F; Self activation

Indexed keywords

AMMONIUM IONS; CO-NI ALLOYS; CRYSTALLINE PHASE; CRYSTALLINITIES; GROWTH MECHANISMS; ION CONCENTRATIONS; METAL ION CONCENTRATION; OPEN-CIRCUIT POTENTIAL; PROCESSING PARAMETERS; SELF-ACTIVATION; SI SUBSTRATES;

ALLOYS; DEPOSITION RATES; ELECTROLESS PLATING; ELECTROLYTES; HYDRAZINE; METAL IONS; PHOTOELECTRONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 84862547639     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2012.04.051     Document Type: Article

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