Electroless nickel plated contacts on porous silicon

Applied Physics Letters

Volumn 68, Issue 10, 1996, Pages 1392-1393

  Dhar, S ^a   Chakrabarti, S ^a  

^a UNIVERSITY OF CALCUTTA   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BUBBLE FORMATION; ELECTRIC PROPERTIES; ELECTROLESS PLATING; HIGH TEMPERATURE OPERATIONS; HYDROGEN; NICKEL PLATING; PHOSPHORUS; POROUS SILICON; SODIUM COMPOUNDS; THICK FILMS;

FILM THICKNESS EFFECTS; MESA ETCHING; RECTIFYING CONTACTS; SODIUM HYPOPHOSPHITE;

OHMIC CONTACTS;

EID: 0030568384     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116090     Document Type: Article

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