Influence of the complexing agents on the thickness uniformity of electroless nickel plating in deep-recessed trenches

Journal of the Electrochemical Society

Volumn 151, Issue 10, 2004, Pages

  Tsunoda, Takanori ^a   Okabe, Toshiyuki ^a   Honma, Hideo ^a  

^a KANTO GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; CATALYSTS; COMPLEXATION; DISSOCIATION; DISSOLUTION; ELECTROLESS PLATING; NICKEL; OPTICAL MICROSCOPY; PALLADIUM; PARAFFINS;

COMPLEXING AGENTS; DEEP-RECESSED TRENCHES; FILM FORMATION; GLYCINE;

ELECTROCHEMISTRY;

EID: 8644262422     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1784211     Document Type: Article

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