Effects of arsenic doping on chemical vapor deposition of titanium silicide

Journal of the Electrochemical Society

Volumn 146, Issue 11, 1999, Pages 4240-4245

  Fang, Hua ^a   Öztürk, Mehmet C ^a   Seebauer, E G ^b   Batchelor, Dale E ^a  

^a North Carolina State University   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ARSENIC; CHEMICAL VAPOR DEPOSITION; DESORPTION; DIFFUSION IN SOLIDS; FILM GROWTH; GRAIN SIZE AND SHAPE; NUCLEATION; PASSIVATION; SEMICONDUCTOR DOPING; SILANES; SILICON WAFERS;

TITANIUM SILICIDE;

TITANIUM COMPOUNDS;

EID: 0033337061     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392621     Document Type: Article

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