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Volumn 911, Issue , 2006, Pages 283-288

Development of PECVD SiC for MEMS using 3MS as the precursor

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; HARDNESS; HYDROGENATION; INDENTATION; MICROELECTROMECHANICAL DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 33750370797     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0911-b05-28     Document Type: Conference Paper
Times cited : (11)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.