Antimicrobial potential of copper-containing titanium surfaces generated by ion implantation and dual high power impulse magnetron sputtering

Advanced Engineering Materials

Volumn 14, Issue 5, 2012, Pages

  Finke, Birgit ^a   Polak, Martin ^a   Hempel, Frank ^a   Rebl, Henrike ^b   Zietz, Carmen ^b   Stranak, Vitezslav ^d   Lukowski, Gerold ^c   Hippler, Rainer ^d   Bader, Rainer ^b   Nebe, J Barbara ^b   Weltmann, Klaus Dieter ^a   Schröder, Karsten ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b UNIVERSITY OF ROSTOCK   (Germany)

^c Institute of Marine Biotechnology   (Germany)

^d UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-MICROBIAL ACTIVITY; ANTI-MICROBIAL EFFECTS; ANTIMICROBIAL SURFACE; ATOMIC ABSORPTION SPECTROSCOPY; COATED IMPLANTS; CU IONS; CU-DOPED; CYTOTOXIC; ENDOPROSTHESES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HUMAN BODIES; IMPLANT-ASSOCIATED INFECTION; PLASMA IMMERSION ION IMPLANTATION; SMALL CONCENTRATION; STAPHYLOCOCCUS AUREUS; TITANIUM SURFACES;

BACTERIA; ION IMPLANTATION; MAGNETRON SPUTTERING; OSTEOBLASTS; PHOTOELECTRONS; PLASMA APPLICATIONS; TITANIUM; TITANIUM ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER;

EID: 84860827467     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.201180054     Document Type: Article

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