Dynamic-moving-window scheme for virtual-metrology model refreshing

IEEE Transactions on Semiconductor Manufacturing

Volumn 25, Issue 2, 2012, Pages 238-246

  Wu, Wei Ming ^a   Cheng, Fan Tien ^a   Kong, Fan Wei ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Dynamic moving window (DMW) scheme; model refreshing; static moving window (SMW) scheme; virtual metrology (VM); weighted Euclidean distance (WED) method

Indexed keywords

CLUSTERING TECHNOLOGIES; DYNAMIC-MOVING-WINDOW (DMW) SCHEME; HISTORICAL DATA; MANUFACTURING QUALITY; PREDICTION ACCURACY; PROCESS TOOLS; STATIC-MOVING-WINDOW (SMW) SCHEME; UNKNOWN ENVIRONMENTS; VIRTUAL METROLOGY; WEIGHTED-EUCLIDEAN-DISTANCE (WED) METHOD; WINDOW SIZE;

MEASUREMENTS;

UNITS OF MEASUREMENT;

EID: 84860688735     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2012.2183398     Document Type: Article

References (19)

1. A. Weber, "Virtual metrology and your technology watch list: Ten things you should know about this emerging technology," Future Fab Int., vol. 22, no. 4, pp. 52-54, Jan. 2007.
2. A. A. Khan, J. R. Moyne, and D. M. Tilbury, "An approach for factorywide control utilizing virtual metrology," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 364-375, Nov. 2007.
3. O. Rothe. (2008, Jul.). ISMI next generation factory. presented at the e-Manufacturing Workshop, SEMICON West [Online]. Available: http://www.sematech. org/meetings/archives/emanufacturing/8546/01-NGF.pdf
4. J. Moyne, "International technology roadmap for semiconductors (ITRS) perspective on AEC/APC," presented at the 21st ISMI AEC/APC Symposium, Ann Arbor, MI, Sep. 2009.
5. J. Moyne, "PCS mechanisms for fab-wide development and latest trends, new directions in PCS: Virtual metrology," presented at the 21st ISMI AEC/APC Symposium, Ann Arbor, MI, Sep. 2009.
6. F.-T. Cheng, H.-C. Huang, and C.-A. Kao, "Developing an automatic virtual metrology system," IEEE Trans. Automat. Sci. Eng., vol. 9, no. 1, pp. 181-188, Jan. 2012.
7. F.-T. Cheng, J. Y.-C. Chang, H.-C. Huang, C.-A. Kao, Y.-L. Chen, and J.-L. Peng, "Benefit model of virtual metrology and integrating AVM into MES," IEEE Trans. Semicond. Manuf., vol. 24, no. 2, pp. 261-272, May 2011.
8. W.-M. Wu, F.-T. Cheng, T.-H. Lin, D.-L. Zeng, and J.-F. Chen, "Selection schemes of dual virtual-metrology outputs for enhancing prediction accuracy," IEEE Trans. Automat. Sci. Eng., vol. 8, no. 2, pp. 311-318, Apr. 2011.
9. F.-T. Cheng, H.-C. Huang, and C.-A. Kao, "Dual-phase virtual metrology scheme," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 566-571, Nov. 2007.
10. A. A. Khan, J. R. Moyne, and D. M. Tilbury, "Virtual metrology and feedback control for semiconductor manufacturing process using recursive partial least squares," J. Process Contr., vol. 18, pp. 961-974, Apr. 2008.
11. S. Lynn, J. V. Ringwood, and N. MacGearailt, "Weighted windowed PLS models for virtual metrology of an industrial plasma etch process," in Proc. IEEE Int. Conf. Indust. Tech., Mar. 2010, pp. 271-276.
12. W.-M. Wu and F.-T. Cheng, "Preliminary study of a dynamic-movingwindow scheme for virtual-metrology model refreshing," in Proc. IEEE Int. Conf. Robot. Automat., May 2012, to be published.
13. G. A. Carpenter and S. Grossberg, "ART 2: Self-organization of stable category recognition codes for analog input patterns," Appl. Optics, vol. 26, no. 12, pp. 4919-4930, Dec. 1987.
14. G. A. Carpenter and S. Grossberg, "A massively parallel architecture for a self-organizing neural pattern recognition machine," Comput. Vision Graphics Image Process., vol. 13, no. 7, pp. 37-54, Jul. 1987.
15. E. Deza and M. M. Deza, Encyclopedia of Distances. New York: Springer, 2009.
16. Y.-T. Huang and F.-T. Cheng, "Automatic data quality evaluation for the AVM system," IEEE Trans. Semicond. Manuf., vol. 24, no. 3, pp. 445-454, Aug. 2011.
17. R. V. Hogg and E. Tanis, Probability and Statistical Inference. Englewood Cliffs, NJ: Prentice-Hall, 1997.
18. D. W. Scott, "Sturges' rule," Wiley Interdisciplinary Rev.: Computat. Statist., vol. l, no. 3, pp. 303-306, Nov. 2009.
19. F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, "Evaluating reliance level of a virtual metrology system," IEEE Trans. Semicond. Manuf., vol. 21, no. 1, pp. 92-103, Feb. 2008.