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Volumn 356, Issue 1, 2012, Pages

Annealing of Si surface region modified by plasma immersion implantation of nitrogen

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EDUCATION; ELLIPSOMETRY; NANOTECHNOLOGY; NITROGEN; NITROGEN PLASMA; REFRACTIVE INDEX; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; SPECTRUM ANALYSIS;

EID: 84860676204     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/356/1/012031     Document Type: Conference Paper
Times cited : (2)

References (11)
  • 11
    • 0031966284 scopus 로고    scopus 로고
    • Infrared spectroscopic ellipsometry: A tool for characterizing nanometer layers
    • DOI 10.1039/a707112d
    • Korte E H and Roseler A 1998 Analyst April 123 647-51 (Pubitemid 28196124)
    • (1998) Analyst , vol.123 , Issue.4 , pp. 647-651
    • Korte, E.H.1    Roseler, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.