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Volumn 356, Issue 1, 2012, Pages
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Annealing of Si surface region modified by plasma immersion implantation of nitrogen
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
EDUCATION;
ELLIPSOMETRY;
NANOTECHNOLOGY;
NITROGEN;
NITROGEN PLASMA;
REFRACTIVE INDEX;
SPECTROSCOPIC ANALYSIS;
SPECTROSCOPIC ELLIPSOMETRY;
SPECTRUM ANALYSIS;
AFTER HIGH TEMPERATURE;
DIFFUSION PROCESS;
ELLIPSOMETRIC DATA;
MOLECULAR NITROGEN;
NANO-STRUCTURED;
PLASMA IMMERSION IMPLANTATIONS;
SI SURFACES;
SI-N BONDS;
SILICON;
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EID: 84860676204
PISSN: 17426588
EISSN: 17426596
Source Type: Conference Proceeding
DOI: 10.1088/1742-6596/356/1/012031 Document Type: Conference Paper |
Times cited : (2)
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References (11)
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