AES analysis of nitridation of Si(100) by 2-10 keV N + 2 ion beams

Applied Surface Science

Volumn 115, Issue 2, 1997, Pages 166-173

  Pan, J S ^a   Wee, A T S ^a   Huan, C H A ^a   Tan, H S ^a   Tan, K L ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SPUTTER DEPOSITION;

NITRIDATION; RADIATION ENHANCED DIFFUSION;

SEMICONDUCTING FILMS;

EID: 0031167358     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80200-0     Document Type: Article

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