Initiated PECVD of organosilicon coatings: A new strategy to enhance monomer structure retention

Plasma Processes and Polymers

Volumn 9, Issue 4, 2012, Pages 425-434

  Coclite, Anna Maria ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

deposition kinetics; FT IR; initiated PECVD; organosilicon precursors; structure retention

Indexed keywords

ARRHENIUS LAW; CARBON CONTENT; DEPOSITION KINETICS; DEPOSITION METHODS; DEPOSITION PROCESS; FILM FORMATIONS; FT-IR; HIGH DEPOSITION RATES; HOT FILAMENT; INITIATED CVD; KINETIC ANALYSIS; LOW POWER; MONOMER MOLECULES; MONOMER STRUCTURES; ORGANO-SILICON PRECURSOR; ORGANOSILICON MONOMERS; ORGANOSILICON POLYMERS; ORGANOSILICONES; PEROXIDE BOND; PLASMA DISCHARGE; PLASMA POWER; RADICAL INITIATORS; RADICAL SPECIES;

ELECTRIC DISCHARGES; PLASMA DENSITY; POLYMERS;

MONOMERS;

EID: 84859828890     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100167     Document Type: Article

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