Thin polymer films with high step coverage in microtrenches by initiated CVD

Chemical Vapor Deposition

Volumn 14, Issue 9-10, 2008, Pages 313-318

  Baxamusa, Salmaan H ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Conformal; Hot filament CVD; iCVD; Polymer; Step coverage

Indexed keywords

ABS RESINS; ASPECT RATIO; FREE RADICAL POLYMERIZATION; MONOMERS; OPTICAL WAVEGUIDES; POLYMER FILMS; POLYMERS; PROBABILITY; RATE CONSTANTS; THICK FILMS; VAPORS;

ANALYTICAL MODELS; ASPECT RATIO TRENCHES; CONFORMAL; HOT FILAMENT CVD; ICVD; MONOMER VAPORS; STEP COVERAGE; STEP COVERAGES; STICKING PROBABILITIES; THIN POLYMER FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 55349144858     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200806713     Document Type: Article

References (43)

1. A. Hasper, J. Holleman, J. Middelhoek, C. R. Kleijn, C. J. Hoogendoorn. J. Electrochem. Soc. 1991, 138, 1728.
2. Y. Akiyama, N. Imaishi, Appl. Phys. Lett. 1995, 67, 620.
3. M. M. IslamRaja, M. A. Cappelli, J. P. McVittie, K. C. Saraswat, J. Appl. Phys. 1991, 70, 7137.
4. Y. Yang, S. Jayaraman, D. Y. Kim, G. S. Girolami, J. R. Abelson, Chem. Mater. 2006, 18, 5088.
5. R. G. Gordon, D. Hausmann, E. Kim, J. Shepard, Chem. Vap. Deposition 2003, 9, 73.
6. S. O. Kucheyev, J. Biener, T. F. Baumann. Y. M. Wang, A. V. Hamza, Z. Li, D. K. Lee, R. G. Gordon, Langmuir 2008, 24, 943.
7. L. E. S. Brink, S. J. G. Elhers, T. Robbertsen, P. Both, J. Membr. Sci. 1993, 76, 281.
8. J. Pieracci, J. V. Crivello, G. Belfort, J. Membr. Sci. 1999, 156, 223.
9. D. S. Wavhal, E. R. Fisher, J. Membr. Sci. 2002, 209, 255.
10. D. J. Irvine, A. M. Mayes, L. G. Griffith, Biomacromolecules 2001, 2, 85.
11. D. J. Irvine, A. V. G. Ruzette, A. M. Mayes, L. G. Griffith, Biomacromolecules 2001, 2, 545.
12. N. C. Greenham, S. C. Moratti, D. D. C. Bradley, R. H. Friend, A. B. Holmes, Nature 1993, 365, 628.
13. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu, E. P. Woo, Science 2000, 290, 2123.
14. A. Wang, I. Kymissis, V. Bulovic, A. I. Akinwande, Appl. Phys. Lett. 2006, 89.
15. R. L. Puurunen, J. Appl. Phys. 2005, 97.
16. G. Percin, B. T. Khuri-Yakub, IEEE Trans. Semicon. Manuf. 2003, 16, 452.
17. T. P. Martin, K. K. S. Lau. K. Chan, Y. Mao, M. Gupta, A. S. O'haughnessy, K. K. Gleason, Surf. Coat. Technol. 2007, 201, 9400.
18. K. Chan, K. K. Gleason, Langmuir 2005, 21, 8930.
19. W. E. Tenhaeff, K. K. Gleason, Langmuir 2007, 23, 6624.
20. Y. Mao, K. K. Gleason, Langmuir 2004, 20, 2484.
21. T. P. Martin, S. E. Kooi, S. H. Chang, K. L. Sedransk, K. K. Gleason, Biomaterials 2007, 28, 909.
22. W. S. O'haughnessy, S. K. Murthy, D. J. Edell, K. K. Gleason, Biomacromolecules 2007, 8, 2564.
23. L. H. Lee, K. K. Gleason, J. Electrochem. Soc. 2008, 155, G78.
24. K. Chan, K. K. Gleason, J. Electrochem. Soc. 2006, 153, C223.
25. J. Puigdollers, C. Voz, A. Orpella, R. Quidant, I. Martin, M. Vetter, R. Alcubilla, Org. Elec. 2004, 5, 67.
26. N. Morosoff, in Plasma Deposition, Treatment, and Etching of Polymers (Ed: R. d'Agostino), Academic Press, San Diego, CA 1990, p. 1.
27. H. Yasuda, Luminous Chemical Vapor Deposition and Interface Engineering, Vol. 122, Marcel-Dekker, New York, NY 2005.
28. J. B. Fortin, T.-M. Lu, Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin Films, Kluwer Academic. Boston, MA 2004.
29. L. S. Lee, K. K. Gleason, Electrochem. Solid State Lett. 2001, 4, 081.
30. S. J. Limb, C. B. Labelle, K. K. Gleason, D. J. Edell, E. F. Gleason, Appl. Phys. Lett. 1996, 68, 2810.
31. E. B. Macak, W. D. Munz, J. M. Rodenburg, J. Appl. Phys. 2003, 94, 2829.
32. H. Y. Chen, Y. Elkasabi, J. Lahann, J. Am. Chem. Soc. 2006, 128, 374.
33. D. Lin-Vien, N. C. W. Fately, J. Grasselli, The Handbook of Infrared and Raman Characteristic Frequencies of Organic Molecules, Academic Press, San Diego, CA 1991.
34. H. Nagai, J. Appl. Polym. Sci 1963, 7, 1697.
35. J. F. O'Hanlon, A User's Guide to Vacuum Technology, Wiley-Interscience, New York, NY 1989.
36. M. Ohring, Materials Science of Thin Films, Academic Press, San Diego, CA 2002.
37. G. A. Somarjai, Introduction to Surface Chemistry and Catalysis, Wiley-Intersciences, New York, NY 1994.
38. K. K. S. Lau, K. K. Gleason, Macromolecules 2006, 39, 3695.
39. M. Gupta, K. K. Gleason, Langmuir 2006, 22, 10047.
40. S. Beuermann, M. Buback, T. P. Davis, N. Garcia, R. G. Gilbert, R. A. Hutchinson, A. Kajiwara, M. Kamachi, I. Lacik, G. T. Russell, Macromol. Chem. Phys. 2003, 204, 1338.
41. H. Kim, J. Vac. Sci. Technol, B 2003, 27, 2231.
42. M. Buback, C. H. Kruz, Macromol. Chem. Phys. 1998, 199, 2301.
43. K. Chan, K. K. Gleason, Macromolecules 2006, 39, 3890.