Facile synthesis and responsive behavior of PDMS-b-PEG diblock copolymer brushes via photoinitiated "thiol-ene" click reaction

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 50, Issue 10, 2012, Pages 2075-2083

  Yang, Muquan ^a   Mao, Jun ^a   Nie, Wei ^a   Dong, Zhixin ^a   Wang, Dapeng ^a   Zhao, Ziliang ^a   Ji, Xiangling ^a  

^a UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

diblock copolymer brush; diblock copolymers; photoinitiate; responsive; spin coating; stimuli sensitive polymers; thiol ene chemistry

Indexed keywords

3-MERCAPTOPROPYLTRIMETHOXYSILANE; CLICK REACTION; DIFFERENT SOLVENTS; FACILE SYNTHESIS; IRRADIATION TIME; PHOTO-INITIATOR; PHOTOINITIATE; POLYDIMETHYLSILOXANE PDMS; RAPID METHOD; RESPONSIVE; SILICON SURFACES; STIMULI-SENSITIVE POLYMERS; THIOL-ENES; UV IRRADIATION; UV-LIGHT; WATER CONTACT ANGLE MEASUREMENT;

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; BRUSHES; BUTADIENE; IRRADIATION; MICROCHANNELS; PHOTOPOLYMERIZATION; POLYETHYLENE OXIDES; SELF ASSEMBLED MONOLAYERS; SILICONES; SPIN COATING; SURFACE REACTIONS; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

POLYETHYLENE GLYCOLS;

EID: 84859571468     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.25985     Document Type: Article

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