Silicon anisotropic etching in TMAH solutions containing alcohol and surfactant additives

Sensors and Actuators, A: Physical

Volumn 178, Issue , 2012, Pages 126-135

  Zubel, Irena ^a   Kramkowska, Małgorzata ^a   Rola, Krzysztof ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Butyl alcohol; Isopropyl alcohol; Silicon anisotropic etching; Surface roughness; TMAH; Triton X 100

Indexed keywords

ALCOHOL ADDITIVES; ALCOHOL CONCENTRATIONS; BUTANOL SOLUTION; ETCHED SURFACE; ETCHING RATE; ETCHING SOLUTIONS; HIGH-QUALITY FINISHES; ISOPROPYL ALCOHOLS; OPTICAL PROFILOMETER; SI(1 0 0); SILICON ANISOTROPIC ETCHING; SURFACE ROUGHNESS PARAMETERS; SURFACTANT ADDITIVES; SURFACTANT MOLECULES; TERNARY SOLUTION; TMAH; TRITON X-100;

ALCOHOLS; SILICON; SILICON WAFERS; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS; WET ETCHING;

ANISOTROPIC ETCHING;

EID: 84859423927     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2012.02.018     Document Type: Article

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